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Solar Cell Manufacturing Equipment

  HDS320 Series Diffusion Furnace

Application for AP,LP,N-type diffusion and anneal/oxidation

Wafer loading ≥1000pcs/batch/tube

Uniformity (120ohm) WIW≤±4%,WTW≤±3%,BTB≤±3%

High efficiency and yield at low C0O

Continuously deposition complex films at front and rear face of cells fastly

In-line automation process

Optimized CCRM and MES software

Up-time >98%